45 nanometer

Results: 52



#Item
21Microtechnology / Photolithography / Extreme ultraviolet / Resist / Ultraviolet / 90 nanometer / 45 nanometer / Materials science / Electromagnetic radiation / Extreme ultraviolet lithography

PROJECT PROFILE T406: Extreme UV consortium for imaging technology (ExCITe) PROCESS EQUIPMENT

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Source URL: www.catrene.org

Language: English - Date: 2009-03-25 10:37:16
2245 nanometer / Wafer / 65 nanometer / Electronic engineering / Semiconductor device fabrication / Microtechnology / Materials science

PROJECT PROFILE 2T102: High yield driven manufacturing excellence in sub-65 nm CMOS (HYMNE) TECHNOLOGY PLATFORM FOR NEXT-GENERATION CORE

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Source URL: www.catrene.org

Language: English - Date: 2009-03-25 10:35:52
23Integrated circuits / Digital electronics / Logic families / 45 nanometer / CMOS / 65 nanometer / 90 nanometer / Semiconductor device fabrication / IMEC / Electronic engineering / Electronics / Materials science

PROJECT PROFILE 2T103: Integration of 45 nm CMOS technology (FOREMOST) TECHNOLOGY PLATFORM FOR NEXT-GENERATION

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Source URL: www.catrene.org

Language: English - Date: 2009-03-25 10:35:54
24Software testing / Application-specific integrated circuit / 45 nanometer / Electronic design automation / Test automation / Automatic test equipment / Design for testing / Electronic engineering / Technology / Electronics

PROJECT PROFILE 2A702: NanoTEST (NanoTEST) EDA FOR SOC DESIGN AND DFM

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Source URL: www.catrene.org

Language: English - Date: 2009-03-25 10:35:42
2522 nanometer / IMEC / 45 nanometer / Photolithography / 65 nanometer / Integrated circuit / Wafer / STMicroelectronics / 90 nanometer / Materials science / Technology / Microtechnology

PROJECT RESULT IC technology integration T207: 65 nm CMOS process in 300 mm wafer

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Source URL: www.catrene.org

Language: English - Date: 2009-03-25 10:39:40
26Ultraviolet / Extreme ultraviolet / Mask / 45 nanometer / Microtechnology / Multiple patterning / Next-generation lithography / Electromagnetic radiation / Extreme ultraviolet lithography / Photomask

PROJECT RESULT Lithography T404: Extreme UV lithography masks (EXTUMASK)

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Source URL: www.catrene.org

Language: English - Date: 2009-03-25 10:39:55
27Chemistry / Multiple patterning / Photolithography / Extreme ultraviolet / Photoresist / Ultraviolet / 32 nanometer / Nanoimprint lithography / 45 nanometer / Materials science / Electromagnetic radiation / Extreme ultraviolet lithography

PROJECT RESULT Lithography T406: Extreme UV consortium for imaging technology (ExCITe)

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Source URL: www.catrene.org

Language: English - Date: 2009-03-25 10:39:59
28Photolithography / Extreme ultraviolet lithography / Nanolithography / Microelectromechanical systems / Lithography / 45 nanometer / SEMATECH / Next-generation lithography / Materials science / Technology / Microtechnology

PROJECT PROFILE T409: Development and proof of concept for projection mask-less lithography (Projection-ML2) HIGH-SPEED

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Source URL: www.catrene.org

Language: English - Date: 2009-03-25 10:37:20
29Multiple patterning / Electronic engineering / Computational lithography / Mentor Graphics / 45 nanometer

PDF Document

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Source URL: s3.mentor.com.s3.amazonaws.com

Language: English - Date: 2012-06-14 13:53:12
30Intel / Greenhouse gas / 45 nanometer / Microprocessor / 65 nanometer / 32 nanometer / Greenhouse gas emissions by the United States / Computer hardware / Electronic engineering / Electronics

Climate Leaders –Intel Update

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Source URL: www.epa.gov

Language: English - Date: 2010-03-31 16:57:46
UPDATE